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Instrumentation and Process Development for Resistive Memory Devices

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dc.contributor.author Monge, Esteban en_US
dc.date.accessioned 2011-09-13T17:31:49Z
dc.date.accessioned 2015-04-24T14:51:58Z
dc.date.available 2011-09-13T17:31:49Z
dc.date.available 2015-04-24T14:51:58Z
dc.date.issued 2009-08-01 en_US
dc.identifier 000000741.sbu.pdf en_US
dc.identifier.uri http://hdl.handle.net/11401/72429 en_US
dc.identifier.uri http://hdl.handle.net/1951/52258 en_US
dc.description.sponsorship This work is sponsored by the Stony Brook University Graduate School in compliance with the requirements for completion of degree. en_US
dc.format Monograph en_US
dc.format.medium Electronic Resource en_US
dc.language.iso en_US en_US
dc.publisher The Graduate School, Stony Brook University: Stony Brook, NY. en_US
dc.subject.lcsh Metal oxides en_US
dc.subject.lcsh Thin film devices en_US
dc.subject.other Nano-scale devices en_US
dc.title Instrumentation and Process Development for Resistive Memory Devices en_US
dc.type Thesis en_US
dc.mimetype Application/PDF en_US

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