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Neutral Atom Lithography Using the 389 nm Transition in Metastable Helium

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dc.contributor.advisor Metcalf, Harold en_US
dc.contributor.author Reeves, Jason R. en_US
dc.contributor.other Department of Physics en_US
dc.date.accessioned 2012-05-15T18:06:08Z
dc.date.accessioned 2015-04-24T14:53:02Z
dc.date.available 2012-05-15T18:06:08Z
dc.date.available 2015-04-24T14:53:02Z
dc.date.issued 2010-08-01
dc.identifier Reeves_grad.sunysb_0771E_10235.pdf en_US
dc.identifier.uri http://hdl.handle.net/1951/55599 en_US
dc.identifier.uri http://hdl.handle.net/11401/72649 en_US
dc.description.abstract Resist based neutral atom lithography with metastable 2<super>3</super>S<sub>1</sub> helium(He. ) has been used to produce small structures in both goldand palladium. A beam of He. from a reverse flow, DC dischargesource is collimated by the bichromatic optical force followed bythree optical molasses velocity compression stages. The He. beamthen crosses a region where a mechanical or optical mask createsthe desired pattern.In the first experiments, a self assembled monolayer (SAM) ofnonanethiol is grown on a gold coated silicon wafer and then exposedto the bright, collimated beam of He. after a Nickel micromesh mask. The mesh protects parts of the SAM from the 20 eVof internal energy deposited by the impact of a He. atom onto thesample surface. The pattern of the mesh is transferred into the~200 &Aring gold layer with a standard selective etch that removes theGold from under the damaged SAM molecules. The samples wereanalyzed with an Atomic Force Microscope and Scanning ElectronMicroscope.The second set of experiments were performed using an opticalmask to pattern a gold coated silicon wafer. In the optical mask,the He. atoms experience the dipole force while traversing a standinglight wave of &lambda<sub>1<\sub> = 1083 nm light tuned 490 MHz above the 2<super>3</super>S<sub>1<\sub>&#8594; 2<super>3</super>P<sub>2</sub> transition or, in separate experiments, &lambda<sub>2<\sub> = 389 nmlight tuned 80 MHz below the 2<super>3</super>S<sub>1<\sub>&#8594; 3<super>3</super>P<sub>2</sub> transition. Using theoptical masks, He. can be focused or channeled into parallel linesseparated by &lambda/2 by varying the intensity of the standing lightwave.The small structures created by the 389 nm optical mask beganapproaching the gold surface granularity. A ~200 &Aring layer of palladium on silicon was chosen as the palladium granularity is muchsmaller and the SAM of nonanethiol will still form on the surface.Experiments using a nickel micro mesh as a mechanical mask havedemonstrated similar features to those in gold. en_US
dc.description.sponsorship This work is sponsored by the Stony Brook University Graduate School in compliance with the requirements for completion of degree. en_US
dc.format Monograph en_US
dc.format.medium Electronic Resource en_US
dc.language.iso en_US en_US
dc.publisher The Graduate School, Stony Brook University: Stony Brook, NY. en_US
dc.subject.lcsh Physics, Atomic en_US
dc.subject.other Atom, Helium, Lithography, Metastable, Neutral en_US
dc.title Neutral Atom Lithography Using the 389 nm Transition in Metastable Helium en_US
dc.type Dissertation en_US
dc.mimetype Application/PDF en_US
dc.contributor.committeemember Dominik Schneble en_US
dc.contributor.committeemember Derek Teaney en_US
dc.contributor.committeemember Jon Longtin. en_US

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